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IEC/TS 61945 Ed. 1.0 b:2000

Interated circuits - Manufacturing line approval - Methodology for technology and failure analysis
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IEC/TS 61945 Ed. 1.0 b:2000

Interated circuits - Manufacturing line approval - Methodology for technology and failure analysis

PUBLISH DATE 2000
IEC/TS 61945 Ed. 1.0 b:2000
Interated circuits - Manufacturing line approval - Methodology for technology and failure analysis
Gives the methodology for technology and failure analysis in manufacturing integrated circuits. Technology analysis is used to determine the way a component is built by observing it using adequate resolution, which increases progressively with the level of analysis.
SDO IEC: International Electrotechnical Commission
Document Number IEC/TS 61945
Publication Date March 1, 2000
Language b - English & French
Page Count
Revision Level 1.0
Supercedes
Committee 47A
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