IEC/TS 62607-6-20 Ed. 1.0 en:2022

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Nanomanufacturing - Key control characteristics - Part 6-20: Graphene-based material - Metallic impurity content: Inductively coupled plasma mass spectrometry

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Nanomanufacturing - Key control characteristics - Part 6-20: Graphene-based material - Metallic impurity content: Inductively coupled plasma mass spectrometry

PUBLISH DATE 2022

Nanomanufacturing - Key control characteristics - Part 6-20: Graphene-based material - Metallic impurity content: Inductively coupled plasma mass spectrometry

IEC TS 62607-6-20:2022 (EN) IEC TS 62607 establishes a standardized method to determine the chemical key control characteristic - metallic impurity content for powders of graphene-based materials by - inductively coupled plasma mass spectrometry (ICP-MS).

The metallic impurity content is derived by the signal intensity of measured elements through MS spectrum of ICP-MS.

- The method is applicable for powder of graphene and related materials, including bilayer graphene (2LG), trilayer graphene (3LG), few-layer graphene (FLG), reduced graphene oxide (rGO) and graphene oxide (GO).

– The typical application area is in the microelectronics industry, e.g. conductive pastes, displays, etc., for manufacturers to guide material design, and for downstream users to select suitable products.

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