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A collection of featured documents from our library that are popular among our users or otherwise noteworthy.
Nanomanufacturing - Key Control Characteristics - Part 6-12: Graphene - Number of layers: Raman spectroscopy, optical reflection
Nanomanufacturing - Key control characteristics - Part 6-13: Graphene powder - Oxygen functional group content: Boehm titration method
Nanomanufacturing - Key control characteristics - Part 6-14: Graphene-based material - Defect level: Raman spectroscopy
Nanomanufacturing - Key control characteristics - Part 6-16: Two-dimensional materials - Carrier concentration: Field effect transistor method
Nanomanufacturing - Key control characteristics - Part 6-17: Graphene-based material - Order parameter: X-ray diffraction and transmission electron microscopy
Nanomanufacturing - Key control characteristics - Part 6-18: Graphene-based material - Functional groups: TGA-FTIR
Nanomanufacturing - Key control characteristics - Part 6-19: Graphene-based material - Elemental composition: CS analyser, ONH analyser
Nanomanufacturing - Key control characteristics - Part 6-2: Graphene - Number of layers: atomic force microscopy, optical transmission, Raman spectroscopy
Nanomanufacturing - Key control characteristics - Part 6-20: Graphene-based material - Metallic impurity content: Inductively coupled plasma mass spectrometry
Nanomanufacturing - Key control characteristics - Part 6-21: Graphene-based material - Elemental composition, C/O ratio: X-ray photoelectron spectroscopy
Nanomanufacturing - Key control characteristics - Part 6-22: Graphene-based material - Ash content: Incineration
Nanomanufacturing - Key control characteristics - Part 6-23: Graphene-related products - Sheet resistance, carrier density, carrier mobility: Hall bar method
Nanomanufacturing - Key control characteristics - Part 6-24: Graphene-related products - Number of layers of graphene: optical contrast
Nanomanufacturing - Key control characteristics - Part 6-26: Graphene-related products - Fracture strain and stress, Youngs modulus, residual strain and residual stress: bulge test
Nanomanufacturing - Key control characteristics - Part 6-27: Graphene-related products - Field-effect mobility for layers of two-dimensional materials: field-effect transistor method
Nanomanufacturing - Key control characteristics - Part 6-28: Graphene-related products - Number of layers for graphene films on a substrate: Raman spectroscopy
Nanomanufacturing - Key control characteristics - Part 6-3: Graphene-based material - Domain size: substrate oxidation
Nanomanufacturing - Key control characteristics - Part 6-30: Graphene-based material - Anion concentration: Ion chromatography method
Nanomanufacturing - Key control characteristics - Part 6-33: Graphene-related products - Defect density of graphene: electron energy loss spectroscopy
Nanomanufacturing - Key control characteristics - Part 6-35: Graphene-related products - Density: free-pouring, tapping and compressing method
<p>Nanomanufacturing - Key control characteristics - Part 6-36: Graphene-related products - Reduction status of graphene oxide and reduced graphene oxide: UV-Vis absorption spectroscopy</p>
Nanomanufacturing - Key control characteristics - Part 6-4: Graphene-based materials - Surface conductance: non-contact microwave resonant cavity method
Nanomanufacturing - Key control characteristics - Part 6-5: Graphene-based materials - Contact and sheet resistance: transmission line measurement
Nanomanufacturing - Key control characteristics - Part 6-6: Graphene - Strain uniformity: Raman spectroscoopy
Nanomanufacturing - Key control characteristics - Part 6-7: Graphene - Sheet resistance: van der Pauw method