Logo
Login Sign Up
Current Revision

IEC 62047-29 Ed. 1.0 en:2017

Semiconductor devices - Micro-electromechanical devices - Part 29: Electromechanical relaxation test method for freestanding conductive thin-films under room temperature
Best Price Guarantee

$131.00

2-5 Days

$131.00

SAVE 10%

$235.80


Sub Total (1 Item(s))

$ 0.00

Estimated Shipping

$ 0.00

Total (Pre-Tax)

$ 0.00


or
International Electrotechnical Commission Logo

IEC 62047-29 Ed. 1.0 en:2017

Semiconductor devices - Micro-electromechanical devices - Part 29: Electromechanical relaxation test method for freestanding conductive thin-films under room temperature

PUBLISH DATE 2026
PAGES 16
IEC 62047-29 Ed. 1.0 en:2017
Semiconductor devices - Micro-electromechanical devices - Part 29: Electromechanical relaxation test method for freestanding conductive thin-films under room temperature
IEC 62047-29:2017(E) specifies a relaxation test method for measuring electromechanical properties of freestanding conductive thin films for micro-electromechanical systems (MEMS) under controlled strain and room temperature. Freestanding thin films of conductive materials are extensively utilized in MEMS, opto-electronics, and flexible/wearable electronics products. Freestanding thin films in the products experience external and internal stresses which could be relaxed even under room temperature during a period of operation, and this relaxation leads to time-dependent variation of electrical performances of the products. This test method is valid for isotropic, homogeneous, and linearly viscoelastic materials.
SDO IEC: International Electrotechnical Commission
Document Number IEC 62047
Publication Date April 1, 2026
Language en - English
Page Count 16
Revision Level 1.0
Supercedes
Committee 47F
Publish Date Document Id Type View
April 1, 2026 IEC 62047-29 Ed. 1.0 en:2017 Revision
Nov. 1, 2017 Revision